Vacuum deposition apparatus and vapor deposition m

专利名称：Vacuum deposition apparatus and vapor

deposition method

发明人：Gu Yao,Suwei Zeng,Peng Xu申请号：US15511577申请日：20160325公开号：US10081860B2公开日：20180925

专利附图：

摘要：The present disclosure relates to the field of display technology, particularly toa vacuum deposition apparatus and a vapor deposition method. The vacuum depositionapparatus includes a vacuum chamber and a rotary base, an evaporation source, and a

plurality of vapor deposition zones arranged in series from bottom to top in the vacuumchamber, wherein the shape of the rotary base is a Reuleaux triangle, and the trajectoriesof movement of its vertices in the horizontal plane is a rounded square, the vapordeposition zones are arranged at intervals along the trajectories of movement of thevertices of the rotary base, the evaporation source is driven by the rotary base to passbelow the vapor deposition zones sequentially, so that the evaporation source can beused to perform the vapor deposition operation in multiple directions simultaneously,thus improving the uniformity of film formation and utilization of the evaporationmaterial.

申请人：BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICSTECHNOLOGY CO., LTD

地址：Beijing CN,Hefei, Anhui CN

国籍：CN,CN

代理机构：Armstrong Teasdale LLP

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